The invention is a geometry into which any solid surface may be machined or grown for the purpose of reducing the secondary electron yield (SEY) of the surface. The specific geometry that constitutes this invention is able to reduce SEY more completely than any of the geometries receiving attention from research and industry, including grooves, pores, foams, and velvets. It is intended for research or industrial use, for those applications which require very low SEY to function correctly. Such applications include particle accelerators, RF amplifier cavities, and electric spacecraft thrusters. The material of the surface can be any solid material.
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