A brief review of the current status of the plasma processing industry and future directions will be given. Followed by discussion of the relevant modeling efforts at PPPL. Fabrication of nanoelectronics devices requires processing of features with sub-10 nm dimensions, with some structures in logic and memory devices being less than 40 atoms wide. To achieve these goals, a multidisciplinary approach is needed that integrates and advances our understanding and predictability of complex processes involving plasma chemistry, plasma-surface interactions, and surface science. Correspondingly, modelling capabilities include particle-in-cell (PIC) codes to model low-pressure discharges and quantum chemistry codes to calculate volume and surface chemistries, and ML/AI techniques to develop reaction pathways.